A modified achromatizing lens

AL Lewis, M Katz, C Oehrlein - Optometry and Vision Science, 1982 - journals.lww.com
A Modified Achromatizing Lens : Optometry and Vision Science A Modified Achromatizing Lens
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Predictability and parafoveal preview effects in the developing reader: Evidence from eye movements.

RL Johnson, EC Oehrlein, WL Roche - Journal of Experimental …, 2018 - psycnet.apa.org
The current study utilized the gaze-contingent boundary paradigm (Rayner, 1975) to examine
the effects of predictability and parafoveal preview on reading behavior of developing …

Dynamic consumption and portfolio decisions with time varying asset returns

W Semmler, L Grüne, C Öhrlein - The Journal of Wealth …, 2009 - search.proquest.com
… The control C is also scaled by wealth, so we have C = %, the control space is U = [0,0.7],
with q = 4001 grid points. Exhibit 2 summarizes the chosen parameters and the gridding …

Freiberg's infraction in a collegiate heptathlete

HJ Palamarchuk, CR Oehrlein - Journal of the American …, 2000 - Am Podiatric Med Assoc
… Level C is continuing deformation as well as collapse of the metatarsal head’s central
portion. Medial and lateral projections from the unaffected areas of the metatarsal head can also …

Fluorocarbon-based plasma etching of Comparison of and discharges

X Li, X Hua, L Ling, GS Oehrlein, M Barela… - Journal of Vacuum …, 2002 - pubs.aip.org
… The CF 2 partial pressure decreases as more Ar is added to the C 4 F 6 /Ar plasmas… C 4 F
8 /Ar shows that the CF 2 partial pressure in C 4 F 6 is higher for Ar-lean gas mixture than for C

Effects of Ar and additives on etching in -based plasmas

…, L Ling, X Hua, M Fukasawa, GS Oehrlein… - Journal of Vacuum …, 2003 - pubs.aip.org
… coupled plasmas fed with C 4 F 8 / Ar and C 4 F 8 / O 2 gas mixtures. The addition of Ar to
C 4 F 8 causes a strong increase of the plasma density relative to that of pure C 4 F 8 (by up to …

Dry etching damage of silicon: A review

GS Oehrlein - Materials Science and Engineering: B, 1989 - Elsevier
… the substrate at a temperature near 250 C [10, 11] which is … an annealing temperature near
800 C for their removal [39, 53… temperature of 200 or 250 C but not 150 C. The results indicate …

The myristoylated alanine‐rich C‐kinase substrate (MARCKS) is sequentially phosphorylated by conventional, novel and atypical isotypes of protein kinase C

T Herget, SA Oehrlein, DJC Pappin… - European journal of …, 1995 - Wiley Online Library
The myristoylated alanine‐rich C‐kinase substrate (MARCKS) is the major protein kinase C
(PKC) substrate in many cell types including fibroblasts and brain cells. Here we describe …

[HTML][HTML] Atomic layer etching at the tipping point: an overview

GS Oehrlein, D Metzler, C Li - … Journal of Solid State Science and …, 2015 - iopscience.iop.org
The ability to achieve near-atomic precision in etching different materials when transferring
lithographically defined templates is a requirement of increasing importance for nanoscale …

Study of and plasmas for highly selective organosilicate glass etching over and SiC

X Hua, X Wang, D Fuentevilla, GS Oehrlein… - Journal of Vacuum …, 2003 - pubs.aip.org
We report the effect of N 2 addition to C 4 F 8 and C 4 F 8 / Ar discharges on plasma etching
rates of organosilicate glass (OSG) and etch stop layer materials ( Si 3 N 4 and SiC), and the …